Silicon (Si) Float Zone (Fz)
Float zone Silicon is a high purity monocrystalline optical grade Silicon, with high transmission and refractive index in the IR. The material is produced using a float zone technique unlike optical Silicon, which is processed using the Czochralski (cz) method. Combined with all these float zone processes, it is suitable to higher IR applications.
Widely used for windows in thermal imaging cameras, wafer production, infrared optical filters and optical filters.
View RoHS Statement
| Dimensions: | Diameters 5mm to 300mm |
| Squares/Rectangles 1mm to 150mm | |
| Thickness Range: | 0.10mm to 100mm (subject to dimension) |
| Edge Finish: | Ground or polished |
| Surface Quality: | 80/50 to 20/40 scratch/dig |
| Parallelism: | Up to 1 arc min |
| Material Options: | N Type, P Type & intrinsic Silicon |
| Purity > 6N | |
| Orientation: | <100> or <111>, resistivity >100 ohm |
| Coating Options: | AR/AR, AR/DLC 1-12 microns range |
Material:
Silicon Float Zone monocrystalline
Dimension Tolerance:
+00/-0.10mm
Thickness Tolerance:
±0.10mm
Edge Thickness:
Fine ground
Surface Quality:
40/20 Scratch dig
Surface Flatness:
1-2 Lambda (@633nm)
Parallelism:
≤ 3 Arc mins